Scalable waveplate for ultraviolet applications using laser-imprinted birefringence in silica

Shevtsov, S. I.; Mireles, M.; Kafka, K. R. P.; Stehlik, M.; Kozlov, A. A.; Lei, Y.; Svirko, Y.; Zuegel, J. D.; Kazansky, P. G.; Demos, S. G.

doi:10.1364/OE.575276

Scalable waveplate for ultraviolet applications using laser-imprinted birefringence in silica

Journal Article · Wed Oct 01 00:00:00 EDT 2025 · Optics Express

DOI:https://doi.org/10.1364/OE.575276· OSTI ID:3001401

Shevtsov, S. I. ^[1]; ^[2]; ^[2]; ^[2]; ^[2]; ^[1]; Svirko, Y. ^[3]; Zuegel, J. D. ^[2]; Kazansky, P. G. ^[1]; ^[2]

Univ. of Southampton (United Kingdom)
Univ. of Rochester, NY (United States). Lab. for Laser Energetics
SPhotonix (Switzerland)

A method for fabrication of large-aperture waveplate suitable for operation in the near-ultraviolet spectral region is demonstrated. The waveplate was fabricated using femtosecond direct laser writing of bulk fused silica. This method enables the precise control of the induced birefringence, which is introduced via the generation of nanopores with geometrical features that are controlled by the laser processing parameters. The resulting structures also introduce a small loss of transmission that is on the order of 4% at 351 nm. The laser-induced–damage threshold in the nanosecond regime was found to approach that of the native fused-silica substrate, which makes it a suitable candidate for polarization control in laser fusion research applications.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of Rochester, NY (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA), Office of Defense Nuclear Security

Grant/Contract Number:: NA0004144

OSTI ID:: 3001401

Journal Information:: Optics Express, Journal Name: Optics Express Journal Issue: 20 Vol. 33; ISSN 1094-4087

Publisher:: Optical Society of America (OSA)Copyright Statement

Country of Publication:: United States

Language:: English

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