Arresting ultraviolet-laser damage in fused silica
- Department of Mechanical Engineering, University of Rochester, Rochester, New York 14623-1299 (United States)
- Laboratory for Laser Energetics, University of Rochester, Rochester, New York, 14623-1299 (United States)
The 351-nm laser-damage initiation threshold for surface damage in conventionally polished fused silica is demonstrated to be stress dependent. By circumferential application of modest loads to a sample, a controllable stress field can be established within the clear aperture of a fused-silica specimen, in response to which both the damage-initiation fluence and the crack-propagation fluence requirements are increased above those for unstressed conditions. {copyright} {ital 1999} {ital Optical Society of America}
- Research Organization:
- University of Rochester
- DOE Contract Number:
- FC03-92SF19460
- OSTI ID:
- 336666
- Journal Information:
- Optics Letters, Journal Name: Optics Letters Journal Issue: 8 Vol. 24; ISSN 0146-9592; ISSN OPLEDP
- Country of Publication:
- United States
- Language:
- English
Similar Records
Dependence of birefringence and residual stress near laser-induced cracks in fused silica on laser fluence and on laser-pulse number
UV Laser Conditioning for Reduction of 351-nm Damage Initiation in Fused Silica
CO2-Laser Polishing for Reduction of 351-nm Surface Damage Initiation in Fused Silica
Journal Article
·
Sat Oct 31 23:00:00 EST 1998
· Applied Optics
·
OSTI ID:295493
UV Laser Conditioning for Reduction of 351-nm Damage Initiation in Fused Silica
Conference
·
Wed Dec 19 23:00:00 EST 2001
·
OSTI ID:15005418
CO2-Laser Polishing for Reduction of 351-nm Surface Damage Initiation in Fused Silica
Conference
·
Wed Oct 31 23:00:00 EST 2001
·
OSTI ID:15004628