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Title: Strongly localized excitons in gallium nitride

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.116182· OSTI ID:283786
; ; ;  [1]; ;  [2]; ;  [3]
  1. Lawrence Berkeley Laboratory and University of California, Berkeley, California 94720 (United States)
  2. Molecular Beam Eptiaxy Laboratory, Department of Electrical, Computer and System Engineering, Boston University, Boston, Massachusetts 02215 (United States)
  3. Ioffe Physico-Technical Institute, 194021 St. Petersburg (Russia)

We report on strong excitonic luminescence in wurtzite GaN at 3.309 and 3.365 eV ({ital T}=6 K). These lines lie well below the band gap and are found commonly in layers grown by different techniques and on different substrates. From detailed photoluminescence investigations we find small thermal activation energies and a very weak electron{endash}phonon coupling. The photoluminescence behavior under hydrostatic pressure is indicative of strongly localized defects. These findings are similar to observations of excitons localized at extended defects such as dislocations in II{endash}VI compounds. {copyright} {ital 1995 American Institute of Physics.}

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
283786
Journal Information:
Applied Physics Letters, Vol. 68, Issue 18; Other Information: PBD: Apr 1996
Country of Publication:
United States
Language:
English