Processing of C{sub 3}H{sub 7}OH, C{sub 2}HCl{sub 3} and CCl{sub 4} in flue gases using silent discharge plasmas, enhanced by (V)UV at 172 nm and 253.7 nm
We present experimental results on (V)LTV enhanced, barrier discharge processing of trichloroethylene (C{sub 2}HCl{sub 3}) and carbon tetrachloride (CCl{sub 4}) in dry and humid air. The contaminated air streams are treated by using a combination of barrier discharges, UV (253.7nm) from a commercial low pressure mercury lamp and VUV from an in-house Xe-excimer source (172nm) driven by a dielectric barrier discharge. Removal efficiencies for both excitation of the contaminated air by the barrier discharge and VUV at 172 nm will be compared with a combined treatment of discharge and irradiation at 253.7 nm and 172 nm. Significant photo-chemical effects include improved generation of both atomic and molecular singlet oxygen from the absorption of ozone in the Hartley band and VUV-regions, and for (V)UV irradiation, direct photolysis of molecular oxygen, water and the pollutant itself. The application of (V)UV irradiation has a substantial effect on final concentrations of the long lived byproducts phosgene and DCAC.
- Research Organization:
- Los Alamos National Lab., NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 279702
- Report Number(s):
- LA-CRADA--96-1; ON: DE96014409
- Country of Publication:
- United States
- Language:
- English
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