Surface nitridation of titanium metal by means of a gas tunnel type plasma jet

Journal Article · Sat Jun 01 04:00:00 EDT 1996 · Journal of Materials Engineering and Performance

DOI:https://doi.org/10.1007/BF02649339· OSTI ID:271749

Kobayashi, A ^[1]

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1. Osaka Univ., Ibaraki, Osaka (Japan). Welding Research Inst.

The surface nitridation of titanium was carried out at a low pressure in nitrogen atmosphere using a gas tunnel type plasma jet. The titanium nitride (TiN) film, 10 {micro}m thick and 2000 HV, could be formed in 10 s. The structure of the TiN film was investigated by XRD. The Vickers hardness on the surface of the film was measured. The effects of deposition conditions on the properties of TiN films (TiN thickness, Vickers hardness, etc.) were investigated, and the advantage of this deposition method was identified from those results.

• Sponsoring Organization: USDOE
• OSTI ID: 271749
• Journal Information: Journal of Materials Engineering and Performance, Journal Name: Journal of Materials Engineering and Performance Journal Issue: 3 Vol. 5; ISSN 1059-9495; ISSN JMEPEG
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DIAGRAMS
FLOW RATE
HARDNESS
MICROSTRUCTURE
NITRIDATION
NITROGEN
SURFACE COATING
THIN FILMS
TIME DEPENDENCE
TITANIUM
TITANIUM NITRIDES
X-RAY DIFFRACTION