Mechanisms enabling reconfigurability and long-term retention in vanadium oxide electrochemical memory
Journal Article
·
· Physical Review Materials
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Texas A&M University, College Station, TX (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- University of Michigan, Ann Arbor, MI (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Texas A&M University, College Station, TX (United States)
Phase coexistence in nanoscale electrochemical random-access memory (ECRAM) has recently been demonstrated to enable both information storage and extraordinary reconfigurability. These proof-of-principle demonstrations have left the mechanistic details of such a process unresolved. Particularly, the mechanisms that stabilize the multiple phases, and the underlying processes behind sustained memory retention, remain unclear, and are necessary to design such devices. Here we report microscale ECRAM devices composed of VO𝑥, which enables us to directly probe the active region in an operando fashion using optical techniques. Using Raman mapping, we show the phase coexistence driven by the electrochemical injection of O vacancies to be spatially uniform (i.e., with no filaments). The stability was observed to be unusually long, with 1% loss over 14 years in ambient conditions. First-principles calculations of the oxygen vacancy formation energies in VO𝑥 further support the thermodynamic coexistence of multiple VO𝑥 phases and clarify the origin of the observed long-term retention in the ECRAM devices. Further, we demonstrate single devices that can be voltage programmed to exhibit synaptic, neuronal, and reconfigurable logic gate functionalities. Furthermore, we not only uncover the phase coexistence mechanism that may help device design, but also demonstrate the circuit-level applications of reconfigurability.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Sandia National Laboratories (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE; USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- AC05-00OR22725; NA0003525
- OSTI ID:
- 2584903
- Alternate ID(s):
- OSTI ID: 2587458
- Report Number(s):
- SAND--2025-10447J; 1728750
- Journal Information:
- Physical Review Materials, Journal Name: Physical Review Materials Journal Issue: 8 Vol. 9; ISSN 2475-9953
- Publisher:
- American Physical Society (APS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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