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Orientation-dependent structural properties during growth and growth mechanism of CoO films

Journal Article · · Applied Surface Science
 [1];  [2];  [2];  [3];  [3];  [2];  [2]
  1. Pohang Univ. of Science and Technology (POSTECH) (Korea, Republic of)
  2. Jeonbuk National University, Jeonju (Korea, Republic of)
  3. Argonne National Laboratory (ANL), Argonne, IL (United States)

The orientation-dependent local structural properties of CoO films on sapphire substrates during growth were investigated through linearly-polarized extended X-ray absorption fine structure (EXAFS) measurements. Specifically, CoO(1 1 1) and (100) crystals with a rock-salt structure (Fm3m) were epitaxially grown on alpha-Al2O3(0001) and (1012) substrates, respectively, at 700 degrees C using a radio-frequency sputtering system. The local structural properties of CoO films in the in-plane and out-of-plane orientations were quantitatively determined using linearly-polarized EXAFS at the Co K-edge during growth. The EXAFS analysis revealed that during the initial stages of growth, the local structural properties exhibit significant differences compared to thick films, with short atomic distances and large (small) Debye-Waller factors observed in the out-of-plane (in-plane) orientations. The local structural strain mostly diminished when approximately 20 CoO layers accumulated on the substrate. Density functional theory (DFT) calculations further supported these findings by confirming that cobalt atoms initially form stable bonds with the sapphire surface, leading to the simultaneous growth of oxygen and cobalt layers in a coordinated manner through layer-by-layer growth.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF); Jeonbuk National University, Jeonju (Korea, Republic of)
Grant/Contract Number:
AC02-06CH11357
OSTI ID:
2563709
Journal Information:
Applied Surface Science, Journal Name: Applied Surface Science Vol. 682; ISSN 0169-4332
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English

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