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Improving Ion Control for Semiconductor Processing with Repetitive Pulsed Power - Phase II Final Technical Report

Technical Report ·
OSTI ID:2467550
 [1]; ;  [2]
  1. Eagle Harbor Technologies, Inc.; Eagle Harbor Technologies, Inc.; Eagle Harbor Technologies, Inc.; Eagle Harbor Technologies, Inc.
  2. Eagle Harbor Technologies, Inc.
+ Show Author Affiliations

Research Organization:
Eagle Harbor Technologies, Inc.
Sponsoring Organization:
USDOE Office of Science (SC), Fusion Energy Sciences (FES)
DOE Contract Number:
SC0021716
OSTI ID:
2467550
Report Number(s):
DOE-EHT-2024-7
Country of Publication:
United States
Language:
English

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Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Ion energy control
high aspect ratio etching
semiconductor processing
tailored waveforms
wafer bias power systems
rf generator replacement