Spatial profiles of metastable densities and electric field strengths in parallel-plate radio frequency discharges

Journal Article · Wed Jan 31 23:00:00 EST 1996 · IEEE Transactions on Plasma Science

DOI:https://doi.org/10.1109/27.491742· OSTI ID:244945

Hebner, G A ^[1]; Greenberg, K E ^[2]

---

1. Sandia National Labs., Albuquerque, NM (United States)
2. Univ. of New Mexico, Albuquerque, NM (United States). Dept. of Chemical and Nuclear Engineering

Radio frequency (RF) excited plasmas are used extensively by industry for processes such as etching, deposition, and cleaning. As a result, numerical simulations with predictive capabilities are being developed to aid in the design and optimization of plasma systems and processes. Here, metastable densities and sheath electric field strengths have been measured in 13.56-MHz parallel-plate helium discharges. Absorption spectroscopy was used to measure the helium singlet metastable density throughout the volume of the discharge. The singlet metastable density appeared to be depleted near the center of the discharge region, particularly at higher powers. Spatially and temporally resolved sheath electric field strength was determined from laser-induced fluorescence measurements of the Stark structure of the n = 11 singlet Rydberg manifold. Two-dimensional (2-D) maps of the electric field strength indicate that the field is uniform across a large fraction of the electrode diameter.

• OSTI ID: 244945
• Journal Information: IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 1 Vol. 24; ISSN ITPSBD; ISSN 0093-3813
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
36 MATERIALS SCIENCE
42 ENGINEERING
ABSORPTION SPECTROSCOPY
CHEMICAL REACTORS
DEPOSITION
ELECTRIC FIELDS
HIGH-FREQUENCY DISCHARGES
INDUSTRIAL PLANTS
ION DENSITY
MATERIALS
MICROELECTRONIC CIRCUITS
PLASMA DIAGNOSTICS
SPATIAL DISTRIBUTION
SURFACE FINISHING