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Exchange-Biased Quantum Anomalous Hall Effect

Journal Article · · Advanced Materials
 [1];  [2];  [3];  [4];  [5];  [4];  [2];  [2];  [2];  [4];  [4];  [4];  [4];  [5];  [2];  [4]
  1. Univ. of California, Los Angeles, CA (United States); OSTI
  2. National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States). Center for Neutron Research
  3. Univ. of California, Los Angeles, CA (United States); Fibertek Inc., Herndon, VA (United States); Army Research Lab., Adelphi, MD (United States); Army Research Lab., Playa Vista, CA (United States)
  4. Univ. of California, Los Angeles, CA (United States)
  5. Tohoku Univ., Sendai (Japan)
The quantum anomalous Hall (QAH) effect is characterized by a dissipationless chiral edge state with a quantized Hall resistance at zero magnetic field. Manipulating the QAH state is of great importance in both the understanding of topological quantum physics and the implementation of dissipationless electronics. Here, the QAH effect is realized in the magnetic topological insulator Cr-doped (Bi,Sb)2Te3 (CBST) grown on an uncompensated antiferromagnetic insulator Al-doped Cr2O3. Through polarized neutron reflectometry (PNR), a strong exchange coupling is found between CBST and Al-Cr2O3 surface spins fixing interfacial magnetic moments perpendicular to the film plane. Further, the interfacial coupling results in an exchange-biased QAH effect. This study further demonstrates that the magnitude and sign of the exchange bias can be effectively controlled using a field training process to set the magnetization of the Al-Cr2O3 layer. It demonstrates the use of the exchange bias effect to effectively manipulate the QAH state, opening new possibilities in QAH-based spintronics.
Research Organization:
Univ. of California, Los Angeles, CA (United States)
Sponsoring Organization:
National Science Foundation (NSF); US Army Research Office (ARO); USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0021117
OSTI ID:
2421731
Alternate ID(s):
OSTI ID: 1987422
Journal Information:
Advanced Materials, Journal Name: Advanced Materials Journal Issue: 31 Vol. 35; ISSN 0935-9648
Publisher:
WileyCopyright Statement
Country of Publication:
United States
Language:
English

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