Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings

Zorn, Gilad; Salisbury, Joshua; Her, Jae-Hyuk; Rose, Rachel; Shower, Patrick

doi:10.1116/6.0002805

Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings

Journal Article · Thu Jul 27 00:00:00 EDT 2023 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/6.0002805· OSTI ID:2418237

^[1]; Salisbury, Joshua ^[2]; ^[2]; Rose, Rachel ^[2]; Shower, Patrick ^[2]

GE Research, Niskayuna, NY (United States); OSTI
GE Research, Niskayuna, NY (United States)

Ti(Si)N coatings were deposited on Si wafers via magnetron sputtering physical vapor deposition technique. Scanning electron microscopy and atomic force microscopy were used to study the morphologies, grain size, and thicknesses of the different films. X-ray diffraction confirmed the formation of the titanium nitride cubic phase. X-ray photoelectron spectroscopy (XPS) was used to study the silicon and oxygen levels in the films, and high resolution XPS was used to determine the surface oxide to nitride ratios as well as the silicon–nitrogen environment. The hardness of these films was then determined with nanoindentation. It was shown that grain size and film density could be controlled by the Si level and the ion bombardment to eliminate the oxygen level in the nitride coatings, which led to the harder films. It was suggested that due to the miscibility of Si, a ternary TiSiN solid solution was formed. Stronger (200) orientation of the TiN B1-NaCl crystals was associated with increased hardness of the coatings. In conclusion, this crystalline structure was preserved after incorporating Si.

View Accepted Manuscript (DOE)

Research Organization:: General Electric Co., Boston, MA (United States)

Sponsoring Organization:: USDOE Office of Fossil Energy and Carbon Management (FECM)

Grant/Contract Number:: FE0031911

OSTI ID:: 2418237

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Journal Issue: 5 Vol. 41; ISSN 0734-2101

Publisher:: American Vacuum Society / AIPCopyright Statement

Country of Publication:: United States

Language:: English

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Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings

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