Probing nano-defects in fused silica by near-field scanning optical microscopy

Journal Article · Mon Mar 16 23:00:00 EST 1998 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.368454· OSTI ID:2409

Wang, L ^[1]

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1. LLNL

Nanodefects were artificially introduced into fused silica surface by nano-indenting with a commercial atomic force microscope (AFM). The sample was illuminated at total internal refkction configuration and evanescent waves were detected by near-field scanning optical probe in the constant tip-sample separation mode. The strain fields associated with non-indents were attributed to the contrast mechanism in optical images. Thus the optical image directly maps out the strain distributions associated with these nano-indents. Optical images were taken at different polarizations of the incident light (s and p). Due to different field distributions near sample surface for the two polarizations, strain distributions at different depth can be probed. The spatial resolution of this technique is hmited by the probe aperture size and detector sensitivity. This technique may be a useful tool to study laser-induced damage mechanisms in optical materials in microscopic scale.

• Research Organization: Lawrence Livermore National Laboratory, Livermore, CA
• Sponsoring Organization: USDOE Office of Defense Programs (DP)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 2409
• Report Number(s): UCRL-JC-130635; 97-ERD-013; ON: DE00002409
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 6 Vol. 84
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
Defects
Scanning Light Microscopy
Silica