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Boron carbide films with reduced nodular defect density deposited by full-face erosion radio-frequency magnetron sputtering

Journal Article · · Journal of Vacuum Science and Technology A
DOI:https://doi.org/10.1116/6.0003571· OSTI ID:2406146

Boron carbide coatings deposited by sputtering with conventional planar magnetrons exhibit nodular growth defects. Here, we demonstrate that the density of nodular defects in B4C films can be greatly reduced by using a full-face-erosion magnetron source that achieves a more uniform target erosion by sweeping the confining magnetic field over the target surface. Here, we systematically study properties of B4C films deposited on substrates with different tilt angles and demonstrate deposition of ultrathick films with compressive residual stress below 200MPa.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program; General Atomics
Grant/Contract Number:
AC52-07NA27344; 89233119CNA000063
OSTI ID:
2406146
Report Number(s):
LLNL-JRNL-860475; 1091687
Journal Information:
Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Journal Issue: 4 Vol. 42; ISSN 0734-2101
Publisher:
American Vacuum Society / AIPCopyright Statement
Country of Publication:
United States
Language:
English

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Figures / Tables (6)