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Even–Odd Layer-Dependent Exchange Bias Effect in MnBi2Te4 Chern Insulator Devices

Journal Article · · Nano Letters
 [1];  [2];  [3];  [2];  [4];  [4];  [2];  [5];  [6];  [7];  [2]
  1. Pennsylvania State Univ., University Park, PA (United States); Nanjing Univ. (China)
  2. Pennsylvania State Univ., University Park, PA (United States)
  3. Nankai Univ., Tianjin (China); Univ. of California, Riverside, CA (United States)
  4. National Institute for Materials Science (NIMS), Tsukuba (Japan)
  5. Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
  6. Nanjing Univ. (China)
  7. Univ. of California, Riverside, CA (United States)
Magnetic topological materials with coexisting magnetism and nontrivial band structures exhibit many novel quantum phenomena, including the quantum anomalous Hall effect, the axion insulator state, and the Weyl semimetal phase. As a stoichiometric layered antiferromagnetic topological insulator, thin films of MnBi2Te4 show fascinating even–odd layer-dependent physics. Here, in this work, we fabricate a series of thin-flake MnBi2Te4 devices using stencil masks and observe the Chern insulator state at high magnetic fields. Upon magnetic field training, a large exchange bias effect is observed in odd but not in even septuple layer (SL) devices. Through theoretical calculations, we attribute the even–odd layer-dependent exchange bias effect to the contrasting surface and bulk magnetic properties of MnBi2Te4 devices. Our findings reveal the microscopic magnetic configuration of MnBi2Te4 thin flakes and highlight the challenges in replicating the zero magnetic field quantum anomalous Hall effect in odd SL MnBi2Te4 devices.
Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
2397382
Journal Information:
Nano Letters, Journal Name: Nano Letters Journal Issue: 27 Vol. 24; ISSN 1530-6984
Publisher:
American Chemical SocietyCopyright Statement
Country of Publication:
United States
Language:
English

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