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Generation of out-of-plane ferroelectric behavior in a one-atom-thick monolayer

Journal Article · · 2D Materials
 [1];  [2];  [3]
  1. Fairfield University, CT (United States); Vanderbilt Univ., Nashville, TN (United States); Vanderbilt University
  2. Vanderbilt Univ., Nashville, TN (United States); Western Michigan Univ., Kalamazoo MI (United States)
  3. Vanderbilt Univ., Nashville, TN (United States)
Ferroelectricity with out-of-plane polarization has so far been found in several two-dimensional (2D) materials, including monolayers comprising three to five planes of atoms, e.g. α-In2Se3 and MoTe2. Here, we explore the generation of out-of-plane polarization within a one-atom-thick monolayer material, namely hexagonal boron nitride. We performed density-functional-theory calculations to explore inducing ferroelectric-like distortions through incorporation of isovalent substitutional impurities that are larger than the host atoms. This disparity in bond lengths causes a buckling of the h-BN, either up or down, which amounts to a dipole with two equivalent energies and opposing orientations. We tested several impurities to explore the magnitude of the induced dipole and the switching energy barrier for dipole inversion. The effects of strain, dipole–dipole interactions, and vertical heterostructures with graphene are further explored. Our results suggest a highly-tunable system with ground state antiferroelectricity and metastable ferroelectricity. Finally, we expect that this work will help foster new ways to include functionality in layered 2D-material-based applications.
Research Organization:
Vanderbilt Univ., Nashville, TN (United States)
Sponsoring Organization:
National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)
Grant/Contract Number:
AC02-05CH11231; FG02-09ER46554
OSTI ID:
2349486
Journal Information:
2D Materials, Journal Name: 2D Materials Journal Issue: 3 Vol. 11; ISSN 2053-1583
Publisher:
IOP PublishingCopyright Statement
Country of Publication:
United States
Language:
English

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