Effect of Acid Etching Time in Ti3C2 MXene’s Interlayer Spacing and Conductivity

Alonzo, Shanna Marie M.; Dahal, Rabin; Ashie, Moses D.; Bastakoti, Bishnu Prasad

doi:10.1093/mam/ozae044.598

Effect of Acid Etching Time in Ti₃C₂ MXene’s Interlayer Spacing and Conductivity

Journal Article · Wed Jul 24 00:00:00 EDT 2024 · Microscopy and Microanalysis

DOI:https://doi.org/10.1093/mam/ozae044.598· OSTI ID:2349400

Alonzo, Shanna Marie M. ^[1]; Dahal, Rabin ^[2]; Ashie, Moses D. ^[2]; Bastakoti, Bishnu Prasad ^[2]

North Carolina Agricultural and Technical State University, Greensboro, NC (United States); NC A&T
North Carolina Agricultural and Technical State University, Greensboro, NC (United States)

Materials with sheet-like morphologies often form interconnected networks of layers or flakes, offering continuous channels for electron and ion transport in electrochemical energy storage applications. One such material is the recently discovered class of 2-D transition metal carbides/nitrides, called MXene, whose general formula is M_n+1X_nT_x (where M = transition metal; n = 1, 2, or 3; X = carbon or nitrogen; and T_x = termination group such as –F, –OH, and/or =O). Ti₃C₂, one of the most studied MXene, can be synthesized by selectively etching the aluminum layer in Ti₃AlC₂ (also called MAX phase). The most straightforward technique to exfoliate this layer is by wet-chemical etching with high-concentration hydrofluoric acid (HF). In this study, the effect of etching time on the morphology, interlayer spacing, and electrical conductivity of the resultant MXene was studied.

View Accepted Manuscript (DOE)

Research Organization:: North Carolina State University, Raleigh, NC (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0024611

OSTI ID:: 2349400

Journal Information:: Microscopy and Microanalysis, Journal Name: Microscopy and Microanalysis Journal Issue: Supplement_1 Vol. 30; ISSN 1431-9276

Publisher:: Microscopy Society of America (MSA)Copyright Statement

Country of Publication:: United States

Language:: English

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