Achieving sub-0.5-angstrom–resolution ptychography in an uncorrected electron microscope

Nguyen, Kayla X.; Jiang, Yi; Lee, Chia-Hao; Kharel, Priti; Zhang, Yue; van der Zande, Arend M.; Huang, Pinshane Y.

doi:10.1126/science.adl2029

Achieving sub-0.5-angstrom–resolution ptychography in an uncorrected electron microscope

Journal Article · Thu Feb 22 00:00:00 EST 2024 · Science

DOI:https://doi.org/10.1126/science.adl2029· OSTI ID:2323561

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University of Illinois at Urbana-Champaign, IL (United States); University of Illinois at Urbana-Champaign
Argonne National Laboratory (ANL), Argonne, IL (United States)
University of Illinois at Urbana-Champaign, IL (United States)

Subangstrom resolution has long been limited to aberration-corrected electron microscopy, where it is a powerful tool for understanding the atomic structure and properties of matter. Here, we demonstrate electron ptychography in an uncorrected scanning transmission electron microscope (STEM) with deep subangstrom spatial resolution down to 0.44 angstroms, exceeding the conventional resolution of aberration-corrected tools and rivaling their highest ptychographic resolutions. Our approach, which we demonstrate on twisted two-dimensional materials in a widely available commercial microscope, far surpasses prior ptychographic resolutions (1 to 5 angstroms) of uncorrected STEMs. We further show how geometric aberrations can create optimized, structured beams for dose-efficient electron ptychography. Our results demonstrate that expensive aberration correctors are no longer required for deep subangstrom resolution.

View Accepted Manuscript (DOE)

Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States); University of Illinois at Urbana-Champaign, IL (United States)

Sponsoring Organization:: National Science Foundation (NSF); US Air Force Office of Scientific Research (AFOSR); USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)

Grant/Contract Number:: AC02-06CH11357; SC0020190

OSTI ID:: 2323561

Alternate ID(s):: OSTI ID: 2356828

Journal Information:: Science, Journal Name: Science Journal Issue: 6685 Vol. 383; ISSN 0036-8075

Publisher:: AAASCopyright Statement

Country of Publication:: United States

Language:: English

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