Achieving sub-0.5-angstrom–resolution ptychography in an uncorrected electron microscope

Nguyen, Kayla X.; Jiang, Yi; Lee, Chia-Hao; Kharel, Priti; Zhang, Yue; van der Zande, Arend M.; Huang, Pinshane Y.

doi:10.1126/science.adl2029

Title: Achieving sub-0.5-angstrom–resolution ptychography in an uncorrected electron microscope

Journal Article · Thu Feb 22 00:00:00 EST 2024 · Science

DOI:https://doi.org/10.1126/science.adl2029· OSTI ID:2323561

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University of Illinois at Urbana-Champaign, IL (United States)
Argonne National Laboratory (ANL), Argonne, IL (United States)

Subangstrom resolution has long been limited to aberration-corrected electron microscopy, where it is a powerful tool for understanding the atomic structure and properties of matter. Here, we demonstrate electron ptychography in an uncorrected scanning transmission electron microscope (STEM) with deep subangstrom spatial resolution down to 0.44 angstroms, exceeding the conventional resolution of aberration-corrected tools and rivaling their highest ptychographic resolutions. Our approach, which we demonstrate on twisted two-dimensional materials in a widely available commercial microscope, far surpasses prior ptychographic resolutions (1 to 5 angstroms) of uncorrected STEMs. We further show how geometric aberrations can create optimized, structured beams for dose-efficient electron ptychography. Our results demonstrate that expensive aberration correctors are no longer required for deep subangstrom resolution.

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Research Organization:: Univ. of Illinois at Urbana-Champaign, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)

Grant/Contract Number:: SC0020190; AC02-06CH11357

OSTI ID:: 2323561

Journal Information:: Science, Vol. 383, Issue 6685; Related Information: Source dataset for this publication; ISSN 0036-8075

Publisher:: AAASCopyright Statement

Country of Publication:: United States

Language:: English

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