Mechanism of electron bunching by an ultrarelativistically intense laser pulse when crossing a nonuniform-plasma boundary
Journal Article
·
· Quantum Electronics (Woodbury, N.Y.)
- Joint Institute for High Temperatures, Russian Academy of Sciences, ul. Izhorskaya 13, stroenie 2, 125412 Moscow (Russian Federation)
Numerical simulations were used to investigate the electron bunching induced by a laser pulse in its penetration into a plasma that has a nonuniform density profile at the vacuum – plasma boundary, which reaches a plateau. A mechanism was found to exist for this plasma which fosters a denser electron grouping in the generated bunch in comparison with the plasma with a sharp boundary. This mechanism is related to the nonstationarity of the wake wave produced by the laser pulse at the beginning of the plasma density plateau. (paper)
- OSTI ID:
- 23141818
- Journal Information:
- Quantum Electronics (Woodbury, N.Y.), Vol. 50, Issue 10; Other Information: Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7818
- Country of Publication:
- United States
- Language:
- English
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