Selective, pulsed CVD of platinum on microfilament gas sensors

Conference · Wed May 01 00:00:00 EDT 1996

OSTI ID:231188

Manginell, R P; Smith, J H; Ricco, A J; Moreno, D J; Hughes, R C ^[1]; Huber, R J ^[2]; Senturia, S D ^[3]

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1. Sandia National Labs., Albuquerque, NM (United States)
2. Utah Univ., Salt Lake City, UT (United States)
3. Massachusetts Inst. of Tech., Cambridge, MA (United States)

A post-processing, selective micro-chemical vapor deposition (``micro-CVD``) technology for the deposition of catalytic films on surface-micromachined, nitride-passivated polysilicon filaments has been investigated. Atmospheric pressure deposition of Pt on microfilaments was accomplished by thermal decomposition of Pt acetylacetonate; deposition occurs selectively only on those filaments which are electrically heated. Catalyst morphology, characterized by SEM, can be controlled by altering deposition time, filament temperature, and through the use of pulsed heating of the filament during deposition. Morphology plays an important role in determining the sensitivity of these devices when used as combustible gas sensors.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 231188
• Report Number(s): SAND--96-0965C; CONF-960673--3; ON: DE96009172
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
DETECTION
FILAMENTS
FLAMMABILITY
GAS ANALYSIS
GASES
MINIATURIZATION
PLATINUM
SILICON