Proton radiation effects on electronic defect states in MOCVD-grown (010) β-Ga2O3
Journal Article
·
· Journal of Applied Physics
- The Ohio State Univ., Columbus, OH (United States); The Ohio State University
- The Ohio State Univ., Columbus, OH (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
The impact of 1.8 MeV proton irradiation on metalorganic chemical vapor deposition grown (010) β-Ga2O3 Schottky diodes is presented. It is found that after a 10.8 × 1013 cm–2 proton fluence the Schottky barrier height of (1.40 ± 0.05 eV) and the ideality factor of (1.05 ± 0.05 ) are unaffected. Capacitance–voltage extracted net ionized doping curves indicate a carrier removal rate of 268 ± 10 cm–1. The defect states responsible for the observed carrier removal are studied through a combination of deep level transient and optical spectroscopies (DLTS/DLOS) as well as lighted capacitance–voltage (LCV) measurements. The dominating effect on the defect spectrum is due to the Ec-2.0 eV defect state observed in DLOS and LCV. This state accounts for ~75 % of the total trap introduction rate and is the primary source of carrier removal from proton irradiation. Of the DLTS detected states, the Ec-0.72 eV state dominated but had a comparably smaller contribution to the trap introduction. These two traps have previously been correlated with acceptor-like gallium vacancy-related defects. Several other trap states at EC-0.36, EC-0.63, and EC-1.09 eV were newly detected after proton irradiation, and two pre-existing states at EC-1.2 and EC-4.4 eV showed a slight increase in concentration after irradiation, together accounting for the remainder of trap introduction. However, a pre-existing trap at Ec-0.40 eV was found to be insensitive to proton irradiation and, therefore, is likely of extrinsic origin. Furthermore, the comprehensive defect characterization of 1.8 MeV proton irradiation damage can aid the modeling and design for a range of radiation tolerant devices.
- Research Organization:
- Georgia Institute of Technology, Atlanta, GA (United States); Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- Air Force Office of Scientific Research (AFOSR); Department of the Defense, Defense Threat Reduction Agency; USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- NA0003525; NA0003921
- OSTI ID:
- 1971636
- Alternate ID(s):
- OSTI ID: 2311671
OSTI ID: 1916513
- Report Number(s):
- SAND--2023-00299J
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 4 Vol. 133; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Similar Records
Proton irradiation effects on minority carrier diffusion length and defect introduction in homoepitaxial and heteroepitaxial n-GaN [Proton irradiation effects on minority carrier diffusion length and defect introduction in homoepitaxial n-GaN]
Journal Article
·
Wed Dec 20 19:00:00 EST 2017
· Journal of Applied Physics
·
OSTI ID:1421641
Related Subjects
42 ENGINEERING
Chemical vapor deposition
Current-voltage characteristic
Deep level transient spectroscopy
Electrical properties and parameters
Optical spectroscopy
Oxides
Radiation damage
Schottky barriers
Schottky diodes
Semiconductor device defects
chemical vapor deposition
current-voltage characteristic
deep level transient spectroscopy
electrical properties and parameters
optical spectroscopy
oxides
radiation damage
semiconductor device defects
Chemical vapor deposition
Current-voltage characteristic
Deep level transient spectroscopy
Electrical properties and parameters
Optical spectroscopy
Oxides
Radiation damage
Schottky barriers
Schottky diodes
Semiconductor device defects
chemical vapor deposition
current-voltage characteristic
deep level transient spectroscopy
electrical properties and parameters
optical spectroscopy
oxides
radiation damage
semiconductor device defects