Impacts to FeRAM Design Arising From Interfacial Dielectric Layers and Wake-Up Modulation in Ferroelectric Hafnium Zirconium Oxide
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States); Radiant Technologies, Albuquerque, NM (United States)
- University of Virginia, Charlottesville, VA (United States); HRL Laboratories, Malibu, CA (United States)
- University of Virginia, Charlottesville, VA (United States)
As ferroelectric hafnium zirconium oxide (HZO) becomes more widely utilized in ferroelectric microelectronics, integration impacts of intentional and non-intentional dielectric interfaces and their effects upon the ferroelectric film wake up and circuit parameters become important to understand. In this work, the effect of the addition of a linear dielectric aluminum oxide, Al2O3, below a ferroelectric Hf0.58Zr0.42O2 film in a capacitor structure for FeRAM applications with NbN electrodes was measured. Depolarization fields resulting from the linear dielectric is observed to induce a reduction of the remanent polarization of the ferroelectric. Addition of the aluminum oxide also impacts the wake up of the HZO with respect to the cycling voltage applied. Intricately linked to the design of a FeRAM 1C/1T cell, the metal-ferroelectric-insulator-metal (MFIM) devices are observed to significantly shift charge related to the read states based on aluminum oxide thickness and wake up cycling voltage. As a result, a 33% reduction in the separation of read states is measured, which complicates how a memory cell is designed and illustrates the importance of clean interfaces in devices.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Pennsylvania State Univ., University Park, PA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- NA0003525; SC0021118
- OSTI ID:
- 2311283
- Alternate ID(s):
- OSTI ID: 2000501
- Report Number(s):
- SAND-2023-09992J
- Journal Information:
- IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, Vol. 71, Issue 2; ISSN 0885-3010
- Publisher:
- IEEECopyright Statement
- Country of Publication:
- United States
- Language:
- English
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