Ion beam assisted sputtered carbon nitride films
Conference
·
OSTI ID:230171
- National Institute of Standards and Technology, Gaithersburg, MD (United States); and others
We have produced amorphous carbon nitride coatings containing up to 40% nitrogen using ion assisted planar magnetron RF sputtering in a nitrogen atmosphere. Coatings up to 2 {mu}m thick were produced on alumina, silicon, SiO{sub 2}, and glass substrates using a graphite target. Films with 95% transparency in the visible wavelengths and harder than silicon have been produced. XPS studies confirm the stability of a carbon nitrogen phase up to 630{degrees}C. The Raman spectra are compared with those of carbon and carbon nitride films prepared by other methods.
- OSTI ID:
- 230171
- Report Number(s):
- CONF-950840--
- Country of Publication:
- United States
- Language:
- English
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