Excimer laser induced chemical vapor deposition of boron nitride films
- General Physics Institute, Moscow (Russian Federation)
The radiation of KrF pulsed excimer laser was used for the deposition of thin BN films from the vapor phase containing borazine (B{sub 3}N{sub 3}H{sub 6}). The dependencies of the film deposition rate upon borazine pressure, laser fluence and substrate were obtained. The composition and the structure of the deposited boron nitride was analysed by means of Raman scattering spectroscopy and Auger electron spectroscopy, which showed that stoichiometric hexagonal boron nitride is the main component of the deposited films. A simple deposition model is proposed, which takes into account chemisorption and partial decomposition of borazine molecules on the substrate surface between laser pulses and final decomposition of the intermediate product during the laser pulse.
- OSTI ID:
- 230167
- Report Number(s):
- CONF-950840--
- Country of Publication:
- United States
- Language:
- English
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