Low-temperature synthesis of diamond films by pulse modulated magnetoactive microwave plasma CVD
Conference
·
OSTI ID:230061
- Osaka Univ. (Japan); and others
Diamond films were deposited by pulse modulated magnetoactive microwave plasma chemical vapor deposition (CVD). Dependence of the deposition rate on the modulation frequency showed a drastic peaking at 500 Hz. Methyl radical (CH{sub 3}) density in the pulse modulated plasma was measured by infrared laser absorption spectroscopy. Optical emission spectroscopy was also carried out to investigate the behavior of atomic hydrogen in the plasma. Time averaged CH{sub 3} density was also enhanced by the pulse modulation, however, the observed behaviors of CH{sub 3} radical density was not sufficient for explanation of the deposition rate.
- OSTI ID:
- 230061
- Report Number(s):
- CONF-950840--
- Country of Publication:
- United States
- Language:
- English
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