Flat-field VLS spectrometer for a wavelength range of 50 – 275 Å

Journal Article · Fri Nov 01 04:00:00 EDT 2019 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QEL17074· OSTI ID:23005036

Kolesnikov, A. O.; Vishnyakov, E. A.; Shatokhin, A. N.

A flat-field VLS spectrograph for a wavelength range ∼50 – 275 Å with an average linear dispersion of 0.18 mm Å{sup −1}, which makes use of a grazing-incidence varied line-space (VLS) grating, was calculated and implemented (a spectrograph of Harada class). To fabricate the VLS grating by interference lithography technique, an algorithm was developed for calculating the writing configuration with an auxiliary aberrating mirror (the solution of the inverse problem of interference lithography). The spectrograph was put to a test and line spectra were recorded from the laser-produced plasma of lithium fluoride and teflon targets, which were excited by a focused laser beam (0.5 J, 8 ns, 1.06 μm). A resolving power λ/d l = 800 was demonstrated in a wavelength region of 135 Å. (x-ray spectrometry)

• OSTI ID: 23005036
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Journal Name: Quantum Electronics (Woodbury, N.Y.) Journal Issue: 11 Vol. 49; ISSN 1063-7818; ISSN QUELEZ
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
BEAMS
GRATINGS
INTERFERENCE
LASER-PRODUCED PLASMA
LASERS
LITHIUM FLUORIDES
SPECTROMETERS
TEFLON
WAVELENGTHS
X-RAY SPECTROSCOPY