Comparison of approaches in the manufacture of broadband mirrors for the EUV range: aperiodic and stack structures

Journal Article · Mon Apr 01 00:00:00 EDT 2019 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QEL16990· OSTI ID:23004918

Barysheva, M. M.; Garakhin, S. A.; Zuev, S. Yu.; Polkovnikov, V. N.; Salashchenko, N. N.; Svechnikov, M. V.; Chkhalo, N. I. ^[1]

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1. Institute for Physics of Microstructures, Russian Academy of Sciences, ul. Akademicheskaya 7, 603087 Afonino, Kstovskii district, Nizhny Novgorod region (Russian Federation)

We have developed the design and experimentally studied aperiodic and stack broadband Mo/Si mirrors for the purposes of the KORTES project, optimised for uniform reflection in the 17 – 21 nm wavelength range. It is shown that stack structures with an insignificant loss in the reflection coefficient are much more preferable from the point of view of manufacturing and certification, which, in turn, makes it possible to correct the deposition process and to reach the calculated parameters of a multilayer mirror in a small number of iterations. (paper)

• OSTI ID: 23004918
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Vol. 49, Issue 4; Other Information: Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
DEPOSITION
MIRRORS
MOLYBDENUM
REFLECTION
SILICON
WAVELENGTHS