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Title: Air-Oxidation of Nb Nano-Films

Journal Article · · Semiconductors
; ; ;  [1];  [2]; ; ;  [3]
  1. National Research University MPEI (Russian Federation)
  2. Chalmers University of Technology (Sweden)
  3. IFW Dresden, Institute for Metallic Materials (Germany)

X-ray photoelectron spectroscopy (XPS) depth chemical and phase profiling of air-oxidized niobium nanofilms has been performed. It is found that oxide layer thicknesses depend on the initial thickness of the niobium nanofilm. The increase in thickness of the initial Nb nano-layer is due to increase in thickness of an oxidized layer.

OSTI ID:
22749940
Journal Information:
Semiconductors, Vol. 52, Issue 5; Other Information: Copyright (c) 2018 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
Country of Publication:
United States
Language:
English

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