Influence of the doping type and level on the morphology of porous Si formed by galvanic etching
- Zelenograd, National Research University of Electronic Technology (MIET) (Russian Federation)
- Russian Academy of Sciences, Institute of Nanotechnology of Microelectronics (Russian Federation)
- Zelenograd, Scientific-Manufacturing Complex “Technological Centre” MIET (Russian Federation)
The formation of porous silicon (por-Si) layers by the galvanic etching of single-crystal Si samples (doped with boron or phosphorus) in an HF/C{sub 2}H{sub 5}OH/H{sub 2}O{sub 2} solution is investigated. The por-Si layers are analyzed by the capillary condensation of nitrogen and scanning electron microscopy (SEM). The dependences of the morphological characteristics of por-Si (pore diameter, specific surface area, pore volume, and thickness of the pore walls), which determine the por-Si combustion kinetics, on the dopant type and initial wafer resistivity are established.
- OSTI ID:
- 22649654
- Journal Information:
- Semiconductors, Journal Name: Semiconductors Journal Issue: 2 Vol. 51; ISSN SMICES; ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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