Composition and optical properties of amorphous a-SiO{sub x}:H films with silicon nanoclusters
- Russian Academy of Sciences, Ioffe Physical–Technical Institute (Russian Federation)
- Voronezh State University (Russian Federation)
The phase composition and optical properties of hydrogenated amorphous films of silicon suboxide (a-SiO{sub x}:H) with silicon nanoclusters are studied. Ultrasoft X-ray emission spectroscopy show that silicon- suboxide films with various oxidation states and various amorphous silicon-cluster contents can be grown using dc discharge modulation. In films with an ncl-Si content of ∼50%, the optical-absorption edge is observed, whose extrapolation yields an optical band gap estimate of ∼3.2–3.3 eV. In the visible region, rather intense photoluminescence bands are observed, whose peak positions indicate the formation of silicon nanoclusters 2.5–4.7 nm in size in these films, depending on the film composition.
- OSTI ID:
- 22645614
- Journal Information:
- Semiconductors, Journal Name: Semiconductors Journal Issue: 2 Vol. 50; ISSN SMICES; ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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