Nanodisk fabrication by nanosphere lithography
Journal Article
·
· AIP Conference Proceedings
- St.Petersburg State University, 7/9 Universitetskaya nab., St. Petersburg, 199034 (Russian Federation)
Top-down fabrication of regular nanodisk arrays from an A{sub 3}B{sub 5} epitaxial heterostructure containing quantum well is demonstrated. Dry ion etching through the mask was emloyed. The spin-coated monolayer of polystyrene nanospheres served as a mask. Nanodisk diameter could be precisely controlled by oxygen plasma resizing of spheres after deposition. Nanodisks with diameters down to 200 nm were made.
- OSTI ID:
- 22609121
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1748; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Torque studies of large-area Co arrays fabricated by etched nanosphere lithography
Homogeneous growth of antidot structures electrodeposited on Si by nanosphere lithography
Uniform InGaAs quantum dot arrays fabricated using nanosphere lithography
Journal Article
·
Sun May 15 00:00:00 EDT 2005
· Journal of Applied Physics
·
OSTI ID:20711652
Homogeneous growth of antidot structures electrodeposited on Si by nanosphere lithography
Journal Article
·
Sun Jun 01 00:00:00 EDT 2008
· Journal of Applied Physics
·
OSTI ID:21137346
Uniform InGaAs quantum dot arrays fabricated using nanosphere lithography
Journal Article
·
Sun Dec 07 23:00:00 EST 2008
· Applied Physics Letters
·
OSTI ID:21175804