Studies on RF sputtered (WO{sub 3}){sub 1-x} (V{sub 2}O{sub 5}){sub x} thin films for smart window applications

Journal Article · Mon May 23 00:00:00 EDT 2016 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4947948· OSTI ID:22608719

Meenakshi, M.; Perumal, P. ^[1]; Sivakumar, R. ^[2]

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1. Department of Physics, Alagappa Government College, Karaikudi-630 003 (India)
2. Directorate of Distance Education, Alagappa University, Karaikudi-630 004 (India)

V{sub 2}O{sub 5} doped WO{sub 3} targets for RF sputtering thin film deposition were prepared for various compositions. Thin films of (WO{sub 3}){sub 1-x} (V{sub 2}O{sub 5}){sub x} were deposited on to glass substrates using these targets. Structural characteristics of the prepared targets and thin films were studied using X-ray diffraction. Laser Raman studies were carried out on the thin films to confirm the compound formation.

• OSTI ID: 22608719
• Journal Information: AIP Conference Proceedings, Vol. 1731, Issue 1; Conference: DAE solid state physics symposium 2015, Uttar Pradesh (India), 21-25 Dec 2015; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
DEPOSITION
DOPED MATERIALS
GLASS
LASER RADIATION
SPUTTERING
SUBSTRATES
THIN FILMS
TUNGSTATES
TUNGSTEN OXIDES
VANADATES
VANADIUM OXIDES
X-RAY DIFFRACTION