Dynamics of magnetized plasma sheaths around a trench

Journal Article · Mon Aug 15 04:00:00 EDT 2016 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.4960327· OSTI ID:22599951

Considering a magnetized plasma sheath, the temporal evolution of the ion properties (the incident ion flux, the ion impact angle, and the incident ion dose) around a rectangular trench is studied numerically. Our results show that the ion flux along the bottom surface greatly reduces in the presence of magnetic field and its uniformity improves, but the magnetic field does not considerably affect the ion flux along the sidewall. In addition, the thickness of the plasma sheath increases by increasing the magnetic field while its conformality to the target surface reduces faster. Moreover, it is shown that any increase in the magnitude (inclination angle) of the magnetic field causes a decrease (an increase) in the angle of incidence of ions on the bottom and sidewall surfaces. Furthermore, in the presence of magnetic field, the ions strike nearly normal to the surface of the bottom while they become less oblique along the sidewall surface. In addition, contrary to the corners of the trench, it is found that the magnetic field greatly affects the incident ion dose at the center of the trench surfaces. Also, it is shown that the incident ion dose along the sidewall is the highest near the center of the sidewall in both magnetized and magnetic-free cases. However, uniformity of the incident ion dose along the sidewall is better than that along the bottom in both magnetized and unmagnetized plasma sheath.

• OSTI ID: 22599951
• Journal Information: Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 8 Vol. 23; ISSN PHPAEN; ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
DOSES
INCIDENCE ANGLE
INCLINATION
IONS
MAGNETIC FIELDS
NUMERICAL ANALYSIS
PLASMA SHEATH
SURFACES
THICKNESS