Two-dimensional fluid modeling of time-dependent plasma sheath

Journal Article · Tue Mar 01 04:00:00 EST 1994 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.587322· OSTI ID:137381

Hong, M P; Emmert, G A ^[1]

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1. Univ. of Wisconsin, Madison, WI (United States)

A two-dimensional code is developed for simulating the nonuniformly expanding plasma sheath when a negative potential is applied to a two-dimensional target immersed in a plasma. The code uses fluid equations for the cold, collisionless ions coupled with the Boltzmann relationship for the electrons and Poisson`s equation. The evolution of the sheath at a square target is simulated numerically. The nonuniformity of the incident dose and the angular distribution of the ions striking the surface near the corner are calculated. The incident dose is higher near the corner of the square target but has its maximum value at a slight distance from the corner. In addition, the angle at which the ions strike the surface is more oblique near the corner and the area over which the oblique angle occurs broadens as the sheath grows. 18 refs., 8 figs.

• OSTI ID: 137381
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 2 Vol. 12; ISSN 0734-211X; ISSN JVTBD9
• Country of Publication: United States
• Language: English

Related Subjects

66 PHYSICS
99 GENERAL AND MISCELLANEOUS
FLOW MODELS
ION IMPLANTATION
PLASMA FLUID EQUATIONS
PLASMA SHEATH
PLASMA SIMULATION
TIME DEPENDENCE
TWO-DIMENSIONAL CALCULATIONS