At-wavelength metrology facility for soft X-ray reflection optics

Journal Article · Sun May 15 00:00:00 EDT 2016 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4950731· OSTI ID:22597933

Bischoff, P.; Eggenstein, F.; Erko, A.; Gaupp, A.; Künstner, S.; Mast, M.; Schmidt, J. -S.; Senf, F.; Siewert, F.; Zeschke, Th.; Schäfers, F. ^[1]

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1. Helmholtz Zentrum Berlin für Materialien und Energie, Institut für Nanometer Optik und Technologie, Albert-Einstein-Str. 15, 12489 Berlin (Germany)

A new Optics Beamline coupled to a versatile UHV reflectometer is successfully operating at BESSY-II. It is used to carry out at-wavelength characterization and calibration of in-house produced gratings and novel nano-optical devices as well as mirrors and multilayer systems in the UV and XUV spectral region. This paper presents most recent commissioning data of the beamline and shows their correlation with initial beamline design calculations. Special attention is paid to beamline key parameters which determine the quality of the measurements such as high-order suppression and stray light behavior. The facility is open to user operation.

• OSTI ID: 22597933
• Journal Information: Review of Scientific Instruments, Vol. 87, Issue 5; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
BESSY STORAGE RING
CALIBRATION
COMMISSIONING
CORRELATIONS
EXTREME ULTRAVIOLET RADIATION
GRATINGS
LAYERS
MIRRORS
OPTICS
REFLECTION
SOFT X RADIATION
WAVELENGTHS