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Title: Applicability of micro-channel plate followed by phosphor screen to charged particles

Abstract

This paper experimentally investigates the applicability of a micro-channel plate (MCP) followed by a phosphor screen to charged particles along with a calibration method for estimating the acceptable limit of input particle flux and appropriate operation parameters of a particular MCP. For the first time, plasmas consisting of only lithium ions are injected into the MCP. Despite large ion numbers (N{sub i}) on the order of ≃10{sup 7}, no deterioration in the effective gain (αG) of the MCP owing to an excess amount of the extracted charge occurs in a certain range of the amplifier voltage (ΔU{sub M}) applied to the MCP. The measured αG nearly agrees with the expected value. However, once ΔU{sub M} exceeds a limit value, αG eventually begins to saturate. This is also verified in experiments using pure electron plasmas. An appropriate range of ΔU{sub M} is presented to avoid saturation and, finally, derive N{sub i} directly from the secondary electron current outputted from the MCP only after the indispensable calibration.

Authors:
; ;  [1]
  1. Department of Electronics, Kyoto Institute of Technology, Goshokaidocho, Matsugasaki, Sakyo Ward, Kyoto 606-8585 (Japan)
Publication Date:
OSTI Identifier:
22597911
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 87; Journal Issue: 6; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; AMPLIFIERS; CALIBRATION; ELECTRIC POTENTIAL; ELECTRONS; LITHIUM IONS; MICROCHANNEL ELECTRON MULTIPLIERS; PARTICLES; PHOSPHORS; SATURATION; SCREENS

Citation Formats

Himura, H., E-mail: himura@kit.ac.jp, Nakata, S., and Sanpei, A. Applicability of micro-channel plate followed by phosphor screen to charged particles. United States: N. p., 2016. Web. doi:10.1063/1.4954406.
Himura, H., E-mail: himura@kit.ac.jp, Nakata, S., & Sanpei, A. Applicability of micro-channel plate followed by phosphor screen to charged particles. United States. doi:10.1063/1.4954406.
Himura, H., E-mail: himura@kit.ac.jp, Nakata, S., and Sanpei, A. 2016. "Applicability of micro-channel plate followed by phosphor screen to charged particles". United States. doi:10.1063/1.4954406.
@article{osti_22597911,
title = {Applicability of micro-channel plate followed by phosphor screen to charged particles},
author = {Himura, H., E-mail: himura@kit.ac.jp and Nakata, S. and Sanpei, A.},
abstractNote = {This paper experimentally investigates the applicability of a micro-channel plate (MCP) followed by a phosphor screen to charged particles along with a calibration method for estimating the acceptable limit of input particle flux and appropriate operation parameters of a particular MCP. For the first time, plasmas consisting of only lithium ions are injected into the MCP. Despite large ion numbers (N{sub i}) on the order of ≃10{sup 7}, no deterioration in the effective gain (αG) of the MCP owing to an excess amount of the extracted charge occurs in a certain range of the amplifier voltage (ΔU{sub M}) applied to the MCP. The measured αG nearly agrees with the expected value. However, once ΔU{sub M} exceeds a limit value, αG eventually begins to saturate. This is also verified in experiments using pure electron plasmas. An appropriate range of ΔU{sub M} is presented to avoid saturation and, finally, derive N{sub i} directly from the secondary electron current outputted from the MCP only after the indispensable calibration.},
doi = {10.1063/1.4954406},
journal = {Review of Scientific Instruments},
number = 6,
volume = 87,
place = {United States},
year = 2016,
month = 6
}
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