Applicability of micro-channel plate followed by phosphor screen to charged particles
- Department of Electronics, Kyoto Institute of Technology, Goshokaidocho, Matsugasaki, Sakyo Ward, Kyoto 606-8585 (Japan)
This paper experimentally investigates the applicability of a micro-channel plate (MCP) followed by a phosphor screen to charged particles along with a calibration method for estimating the acceptable limit of input particle flux and appropriate operation parameters of a particular MCP. For the first time, plasmas consisting of only lithium ions are injected into the MCP. Despite large ion numbers (N{sub i}) on the order of ≃10{sup 7}, no deterioration in the effective gain (αG) of the MCP owing to an excess amount of the extracted charge occurs in a certain range of the amplifier voltage (ΔU{sub M}) applied to the MCP. The measured αG nearly agrees with the expected value. However, once ΔU{sub M} exceeds a limit value, αG eventually begins to saturate. This is also verified in experiments using pure electron plasmas. An appropriate range of ΔU{sub M} is presented to avoid saturation and, finally, derive N{sub i} directly from the secondary electron current outputted from the MCP only after the indispensable calibration.
- OSTI ID:
- 22597911
- Journal Information:
- Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 6 Vol. 87; ISSN 0034-6748; ISSN RSINAK
- Country of Publication:
- United States
- Language:
- English
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