In-situ synchrotron micro-diffraction study of surface, interface, grain structure, and strain/stress evolution during Sn whisker/hillock formation
- School of Engineering, Brown University, Providence, Rhode Island 02912 (United States)
- IBM, Hopewell Junction, New York 12533 (United States)
- Saint-Gobain, Northboro R&D Center, Northborough, Massachusetts 01532 (United States)
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
- Oak Ridge National Lab, Oak Ridge, Tennessee 37831 (United States)
We have performed X-ray synchrotron micro-diffraction measurements to study the processes controlling the formation of hillocks and whiskers in Sn layers on Cu. The studies were done in real-time on Sn layers that were electro-deposited immediately before the X-ray measurements were started. This enabled a region of the sample to be monitored from the as-deposited state until after a hillock feature formed. In addition to measuring the grain orientation and deviatoric strain (via Laue diffraction), the X-ray fluorescence was monitored to quantify the evolution of the Sn surface morphology and the formation of intermetallic compound (IMC) at the Sn-Cu interface. The results capture the simultaneous growth of the feature and the corresponding film stress, grain orientation, and IMC formation. The observations are compared with proposed mechanisms for whisker/hillock growth and nucleation.
- OSTI ID:
- 22596885
- Journal Information:
- Journal of Applied Physics, Vol. 119, Issue 10; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
COMPARATIVE EVALUATIONS
COPPER
DEPOSITS
DIFFRACTION
FLUORESCENCE
GRAIN ORIENTATION
INTERFACES
INTERMETALLIC COMPOUNDS
MORPHOLOGY
STRAINS
STRESSES
SURFACES
SYNCHROTRONS
TIN
WHISKERS
X RADIATION