Emission-wavelength tuning of InAs quantum dots grown on nitrogen-δ-doped GaAs(001)

Journal Article · Sat May 21 04:00:00 EDT 2016 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4951719· OSTI ID:22596702

Kaizu, Toshiyuki ^[1]; Taguchi, Kohei; Kita, Takashi ^[2]

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1. Center for Supports to Research and Education Activities, Kobe University, 1-1 Rokkodai, Nada, Kobe 657-8501 (Japan)
2. Department of Electrical and Electronic Engineering, Faculty of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe 657-8501 (Japan)

We studied the structural and photoluminescence (PL) characteristics of InAs quantum dots (QDs) grown on nitrogen (N) δ-doped GaAs(001). The emission wavelength for low-density N-δ doping exhibited a blueshift with respect to that for undoped GaAs and was redshifted with increasing N-sheet density. This behavior corresponded to the variation in the In composition of the QDs. N-δ doping has two opposite and competing effects on the incorporation of Ga atoms from the underlying layer into the QDs during the QD growth. One is the enhancement of Ga incorporation induced by the lattice strain, which is due to the smaller radius of N atoms. The other is an effect blocking for Ga incorporation, which is due to the large bonding energy of Ga-N or In-N. At a low N-sheet density, the lattice-strain effect was dominant, while the blocking effect became larger with increasing N-sheet density. Therefore, the incorporation of Ga from the underlying layer depended on the N-sheet density. Since the In-Ga intermixing between the QDs and the GaAs cap layer during capping also depended on the size of the as-grown QDs, which was affected by the N-sheet density, the superposition of these three factors determined the composition of the QDs. In addition, the piezoelectric effect, which was induced with increased accumulation of lattice strain and the associated high In composition, also affected the PL properties of the QDs. As a result, tuning of the emission wavelength from 1.12 to 1.26 μm was achieved at room temperature.

• OSTI ID: 22596702
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 19 Vol. 119; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ATOMS
BONDING
BUILDUP
CHANNELING
DENSITY
DOPED MATERIALS
GALLIUM ARSENIDES
INDIUM ARSENIDES
LAYERS
NITROGEN
PHOTOLUMINESCENCE
PIEZOELECTRICITY
QUANTUM DOTS
RED SHIFT
SHEETS
STRAINS
TEMPERATURE RANGE 0273-0400 K
TUNING
WAVELENGTHS