Direct laser writing of polymeric nanostructures via optically induced local thermal effect
- Laboratoire de Photonique Quantique et Moléculaire, UMR 8537, École Normale Supérieure de Cachan, CentraleSupélec, CNRS, Université Paris-Saclay, 61 avenue du Président Wilson, 94235 Cachan (France)
We demonstrate the fabrication of desired structures with feature size below the diffraction limit by use of a positive photoresist. The direct laser writing technique employing a continuous-wave laser was used to optically induce a local thermal effect in a positive photoresist, which then allowed the formation of solid nanostructures. This technique enabled us to realize multi-dimensional sub-microstructures by use of a positive photoresist, with a feature size down to 57 nm. This mechanism acting on positive photoresists opens a simple and low-cost way for nanofabrication.
- OSTI ID:
- 22591679
- Journal Information:
- Applied Physics Letters, Vol. 108, Issue 18; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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