High-Speed Direct Laser Writing of Silver Nanostructures via Two-Photon Reduction
Journal Article
·
· Advanced Engineering Materials
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). Center for Engineered Materials & Manufacturing
Despite the widespread use of metallic nanostructures in several emerging applications, high-throughput template-free fabrication techniques that are capable of patterning arbitrarily complex nanostructures are lacking. Two-photon reduction-based direct laser writing is a promising technique due to its ability to fabricate geometrically intricate metallic structures with sub-diffraction nanoscale features. Unfortunately, the extremely low writing speed of ≈10 μm s-1 makes this process impractical for large-scale manufacturing. The operating speed is currently limited by a lack of photoresist materials that can operate under high-speed writing conditions. Herein, a silver-containing aqueous photoresist recipe is presented that increases the writing speed to 1 cm s-1 while maintaining the ability to fabricate sub-diffraction silver nanowires as thin as 500 nm. In addition, the electrical conductivity of the printed silver is within one-fifth that of bulk silver. Strikingly, it is demonstrated here that the conventional design rule of using surfactants to promote high-quality printing is faulty under high-speed conditions. Instead, surfactants limit the throughput and are eliminated to enable high-speed writing. The 1000× throughput scale-up presented here significantly improves our ability to transition nano-enabled devices from research laboratories to real-world adoption.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE; USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- AC52-07NA27344
- OSTI ID:
- 1863690
- Alternate ID(s):
- OSTI ID: 1562553
- Report Number(s):
- LLNL-JRNL-773864; 966386
- Journal Information:
- Advanced Engineering Materials, Journal Name: Advanced Engineering Materials Journal Issue: 9 Vol. 21; ISSN 1438-1656
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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