A controllable IC-compatible thin-film fuse realized using electro-explosion
- School of Mechatronical Engineering, Beijing Institute of Technology, Beijing 100081 (China)
A controllable IC-compatible thin-film fuse was developed that had Al/SiO{sub 2} thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows within 400 ns at 10 V. It can be used for small electronic elements as well as electropyrotechnic initiators to improve the no-firing current.
- OSTI ID:
- 22492422
- Journal Information:
- AIP Advances, Vol. 6, Issue 1; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2158-3226
- Country of Publication:
- United States
- Language:
- English
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