skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Highly conductive and optically transparent polycrystalline iridium oxide thin films grown by reactive pulsed laser deposition

Conference ·
OSTI ID:20015566

Reactive pulsed laser deposition has been used to deposit IrO{sub 2} thin films on both SiO{sub 2} and fused quartz substrates, by ablating a metal iridium target in oxygen atmosphere. At a KrF laser intensity of about 1.7 x 10{sup 9} W/cm{sup 2}, IrO{sub 2} films were deposited at substrate deposition temperatures ranging from room-temperature to 700 C under an optimum oxygen ambient pressure of 200 mTorr. The structure, morphology, electrical resistivity and optical transmission of the deposited films were characterized as a function of their deposition temperature (T{sub d}). High quality IrO{sub 2} films are obtained in the 400--600 C deposition temperature range. They are polycrystalline with preferred orientations, depending on the substrate, and show a dense granular morphology. At a T{sub d} as low as 400 C, highly conductive IrO{sub 2} films with room-temperature resistivities as low as (42 {+-} 6) {micro}{Omega} cm are obtained. Over the 300--600 C T{sub d} range, the IrO{sub 2} films were found to exhibit a maximum optical transmission at 450 C ({approximately}45% at 500 nm for 80 nm-thick films).

Research Organization:
INRS, Varennes, Quebec (CA)
Sponsoring Organization:
Natural Sciences and Engineering Research Council of Canada (NSERC)
OSTI ID:
20015566
Resource Relation:
Conference: Polycrystalline thin films - Structure, Texture, Properties and Applications III, San Francisco, CA (US), 03/31/1997--04/04/1997; Other Information: Single article reprints from this publication are available through University Microfilms Inc., 300 North Zeeb Road, Ann Arbor, MI 48106; PBD: 1997; Related Information: In: Polycrystalline thin films -- Structure, texture, properties and applications III. Materials Research Society symposium proceedings: Volume 472, by Yalisove, S.M.; Adams, B.L.; Im, J.S.; Zhu, Y.; Chen, F.R. [eds.], 489 pages.
Country of Publication:
United States
Language:
English

Similar Records

Electrochromic lithium nickel oxide thin film by pulsed laser deposition
Conference · Tue Oct 01 00:00:00 EDT 1996 · OSTI ID:20015566

Electrochromic lithium nickel oxide by pulsed laser deposition and sputtering
Technical Report · Sun Sep 01 00:00:00 EDT 1996 · OSTI ID:20015566

Growth and characterization of laser-deposited superconducting Bi--Sr--Ca--Cu--O thin films
Journal Article · Thu Jul 01 00:00:00 EDT 1993 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) · OSTI ID:20015566