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Characterization of midwave infrared InSb avalanche photodiode

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4922977· OSTI ID:22490731
 [1]; ;  [1];  [2];  [3]
  1. Université Montpellier, IES, UMR 5214, F-34095 Montpellier (France)
  2. CEA-LETI, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France)
  3. SOFRADIR, BP 21, 38113 Veurey-Voroize (France)

This paper focuses on the InSb material potential for the elaboration of Avalanche Photodiodes (APD) for high performance infrared imaging applications, both in passive or active mode. The first InSb electron-APD structure was grown by molecular beam epitaxy, processed and electrically characterized. The device performances are at the state of the art for the InSb epi-diode technology, with a dark current density J(−50 mV) = 32 nA/cm{sup 2} at 77 K. Then, a pure electron injection was performed, and an avalanche gain, increasing exponentially, was observed with a gain value near 3 at −4 V at 77 K. The Okuto–Crowell model was used to determine the electron ionization coefficient α(E) in InSb, and the InSb gain behavior is compared with the one of InAs and MCT APDs.

OSTI ID:
22490731
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 24 Vol. 117; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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