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Title: Self-assembly of Ge quantum dots on periodically corrugated Si surfaces

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4935859· OSTI ID:22486095
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  1. Rudjer Bošković Institute, Bijenička cesta 54, 10000 Zagreb (Croatia)
  2. Helmholtz-Zentrum Dresden-Rossendorf, Bautzner Landstrasse 400, 01328 Dresden (Germany)
  3. Institute of Physics, Bijenička cesta 46, 10000 Zagreb (Croatia)
  4. Charles University in Prague, Ke Karlovu 5, 12 161 Prague (Czech Republic)

The fabrication of regularly ordered Ge quantum dot arrays on Si surfaces usually requires extensive preparation processing, ensuring clean and atomically ordered substrates, while the ordering parameters are quite limited by the surface properties of the substrate. Here, we demonstrate a simple method for fabrication of ordered Ge quantum dots with highly tunable ordering parameters on rippled Si surfaces. The ordering is achieved by magnetron sputter deposition, followed by an annealing in high vacuum. We show that the type of ordering and lattice vector parameters of the formed Ge quantum dot lattice are determined by the crystallographic properties of the ripples, i.e., by their shape and orientation. Moreover, the ordering is achieved regardless the initial amorphisation of the ripples surface and the presence of a thin oxide layer.

OSTI ID:
22486095
Journal Information:
Applied Physics Letters, Vol. 107, Issue 20; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English