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Ultrathin quasi-2D amorphous carbon dielectric prepared from solution precursor for nanoelectronics

Journal Article · · Communications Engineering
Abstract

Materials keeping thickness in atomic scale but extending primarily in lateral dimensions offer properties attractive for many emerging applications. However, compared to crystalline counterparts, synthesis of atomically thin films in the highly disordered amorphous form, which avoids nonuniformity and defects associated with grain boundaries, is challenging due to their metastable nature. Here we present a scalable and solution-based strategy to prepare large-area, freestanding quasi-2D amorphous carbon nanomembranes with predominant sp 2 bonding and thickness down to 1–2 atomic layers, from coal-derived carbon dots as precursors. These atomically thin amorphous carbon films are mechanically strong with modulus of 400 ± 100 GPa and demonstrate robust dielectric properties with high dielectric strength above 20 MV cm −1 and low leakage current density below 10 −4  A cm −2 through a scaled thickness of three-atomic layers. They can be implemented as solution-deposited ultrathin gate dielectrics in transistors or ion-transport media in memristors, enabling exceptional device performance and spatiotemporal uniformity.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
National Science Foundation (NSF); US Department of the Navy, Office of Naval Research (ONR); USDOE; USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE Office of Fossil Energy and Carbon Management (FECM); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
2246990
Alternate ID(s):
OSTI ID: 2345287
Journal Information:
Communications Engineering, Journal Name: Communications Engineering Journal Issue: 1 Vol. 2; ISSN 2731-3395
Publisher:
Nature Publishing GroupCopyright Statement
Country of Publication:
Country unknown/Code not available
Language:
English

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