Film transfer enabled by nanosheet seed layers on arbitrary sacrificial substrates

Journal Article · Fri May 01 04:00:00 EDT 2015 · APL materials

DOI:https://doi.org/10.1063/1.4921070· OSTI ID:22415285

Dral, A. P.; Nijland, M.; Koster, G.; Elshof, J. E. ten, ^[1]

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1. MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede (Netherlands)

An approach for film transfer is demonstrated that makes use of seed layers of nanosheets on arbitrary sacrificial substrates. Epitaxial SrTiO{sub 3}, SrRuO{sub 3}, and BiFeO{sub 3} films were grown on Ca{sub 2}Nb{sub 3}O{sub 10} nanosheet seed layers on phlogopite mica substrates. Cleavage of the mica substrates enabled film transfer to flexible polyethylene terephthalate substrates. Electron backscatter diffraction, X-ray diffraction, and atomic force microscopy confirmed that crystal orientation and film morphology remained intact during transfer. The generic nature of this approach is illustrated by growing films on zinc oxide substrates with a nanosheet seed layer. Film transfer to a flexible substrate was accomplished via acid etching.

• OSTI ID: 22415285
• Journal Information: APL materials, Journal Name: APL materials Journal Issue: 5 Vol. 3; ISSN AMPADS; ISSN 2166-532X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ATOMIC FORCE MICROSCOPY
CALCIUM COMPOUNDS
CRYSTALS
ELECTRON DIFFRACTION
EPITAXY
FILMS
LAYERS
MICA
MORPHOLOGY
NANOSTRUCTURES
NIOBATES
POLYESTERS
STRONTIUM TITANATES
SUBSTRATES
X-RAY DIFFRACTION
ZINC OXIDES