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Complex oxide growth using simultaneous in situ reflection high-energy electron diffraction and x-ray reflectivity: When is one layer complete?

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4906419· OSTI ID:22415129
;  [1];  [2];  [3];  [1];  [2]
  1. Cornell High Energy Synchrotron Source, Cornell University, Ithaca, New York 14853 (United States)
  2. School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853 (United States)
  3. Department of Physics and Astronomy, Ithaca College, Ithaca, New York 14850 (United States)
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During layer-by-layer homoepitaxial growth, both the Reflection High-Energy Electron Diffraction (RHEED) intensity and the x-ray reflection intensity will oscillate, and each complete oscillation indicates the addition of one monolayer of material. However, it is well documented, but not well understood, that the phase of the RHEED oscillations varies from growth to growth and thus the maxima in the RHEED intensity oscillations do not necessarily occur at the completion of a layer. We demonstrate this by using simultaneous in situ x-ray reflectivity and RHEED to characterize layer-by-layer growth of SrTiO{sub 3}. We show that we can control the RHEED oscillation phase by changing the pre-growth substrate annealing conditions, changing the RHEED oscillation phase by as much as 137°. In addition, during growth via pulsed laser deposition, the relaxation times between each laser pulse can be used to determine when a layer is complete, independent of the phase of the RHEED oscillation.
OSTI ID:
22415129
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 3 Vol. 106; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

Cited By (6)

Development of a hybrid molecular beam epitaxy deposition system for in situ surface x-ray studies journal March 2018
In situ surface/interface x-ray diffractometer for oxide molecular beam epitaxy journal January 2016
Thin film growth studies using time-resolved x-ray scattering journal November 2016
Quick X-ray reflectivity using monochromatic synchrotron radiation for time-resolved applications journal April 2018
Chemically specific termination control of oxide interfaces via layer-by-layer mean inner potential engineering journal July 2018
Quick X-ray Reflectivity using Monochromatic Synchrotron Radiation for Time-Resolved Applications text January 2017

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Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANNEALING
ELECTRON DIFFRACTION
ENERGY BEAM DEPOSITION
LASER RADIATION
LAYERS
OXIDES
PULSED IRRADIATION
REFLECTION
REFLECTIVITY
STRONTIUM TITANATES
SUBSTRATES
X RADIATION