Relationship between the discharge mode and the spatial oxygen plasma distribution in a large size ferrite inductively coupled plasmas
- Department of Electrical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
- R and D Center for PSK-INC Corporation, Hwaseong-si 445-170 (Korea, Republic of)
- Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
The electrical characteristics and the spatial distribution of oxygen plasma according to the number of turns in ferrite inductively coupled plasmas (ferrite ICPs) are investigated. Through a new ICP model, which includes the capacitive coupling and the power loss of the ferrite material with the conventional ICP model, the variation of the oxygen discharge characteristics depending on the number of turns is simply understood by the electrical measurement, such as the antenna voltages and the currents. As the number of the turns increases, the capacitive coupling dominantly affects the spatial plasma distribution. This capacitive coupling results in a center focused density profile along the radial direction. In spite of the same discharge conditions (discharge chamber, neutral gas, and pressure), the spatial plasma distribution over 450 mm has drastic changes by increasing number of the turns. In addition, the effect of the negative species to the density profile is compared with the argon discharge characteristics at the same discharge configuration.
- OSTI ID:
- 22408365
- Journal Information:
- Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 4 Vol. 22; ISSN PHPAEN; ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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