Superior carrier confinement in InAlN/InGaN/AlGaN double heterostructures grown by metal-organic chemical vapor deposition
- Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071 (China)
InAlN/InGaN/AlGaN double heterostructures were grown and characterized. Temperature-dependent Hall measurements show that the two-dimensional electron gas has a steady density over the entire temperature range tested and a superior transport property compared with the traditional InAlN/GaN single heterostructure at elevated temperatures. The improved performance was attributed to the back barrier, which enhanced the carrier confinement and prevented electrons from spilling into the buffer. In addition, the room-temperature electron mobility of the double heterostructure was 1293 cm{sup 2}/Vs, which is the highest reported for an InGaN-channel heterostructure.
- OSTI ID:
- 22402440
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 22; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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