C ion-implanted TiO{sub 2} thin film for photocatalytic applications

Journal Article · Sat Mar 14 04:00:00 EDT 2015 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4915111· OSTI ID:22399276

Scuderi, V.; Sanz, R.; Privitera, V. ^[1]; Romano, L. ^[1]; Napolitani, E. ^[1]; Carles, R. ^[2]

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1. CNR-IMM MATIS, Via S. Sofia 64, 95123 Catania (Italy)
2. Université de Toulouse, CEMES CNRS, 29 rue Marvig, BP 94347, 31055 Toulouse Cedex 4 (France)

Third-generation TiO{sub 2} photocatalysts were prepared by implantation of C{sup +} ions into 110 nm thick TiO{sub 2} films. An accurate structural investigation was performed by Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, Raman-luminescence spectroscopy, and UV/VIS optical characterization. The C doping locally modified the TiO{sub 2} pure films, lowering the band-gap energy from 3.3 eV to a value of 1.8 eV, making the material sensitive to visible light. The synthesized materials are photocatalytically active in the degradation of organic compounds in water under both UV and visible light irradiation, without the help of any additional thermal treatment. These results increase the understanding of the C-doped titanium dioxide, helpful for future environmental applications.

• OSTI ID: 22399276
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 10 Vol. 117; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CARBON IONS
DOPED MATERIALS
ENERGY GAP
EV RANGE
HEAT TREATMENTS
ION IMPLANTATION
IRRADIATION
LUMINESCENCE
MASS SPECTROSCOPY
ORGANIC COMPOUNDS
PHOTOCATALYSIS
RAMAN SPECTROSCOPY
RUTHERFORD BACKSCATTERING SPECTROSCOPY
THIN FILMS
TITANIUM OXIDES
VISIBLE RADIATION
WATER
X-RAY DIFFRACTION