Thermal chemistry of the Cu-KI5 atomic layer deposition precursor on a copper surface
Journal Article
·
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
- Department of Chemistry, University of California, Riverside, California 92521 (United States)
The thermal chemistry of a Cu(I) ketoiminate complex, Cu-KI5, resulting from the modification of the known Air Products CupraSelect{sup ®} copper CVD precursor Cu(hfac)(tmvs) designed to tether the two ligands via an isopropoxide linker, was studied under ultrahigh vacuum on a Cu(110) single-crystal surface by using a combination of temperature programmed desorption (TPD) and x-ray photoelectron spectroscopy. Adsorption at low temperatures was determined to take place via the displacement of the vinyl ligand by the surface. Molecular desorption was seen at 210 K, and the evolution of Cu(II)-KI5{sub 2} was established to take place at 280 K, presumably from a disproportionation reaction that also leads to the deposition of Cu(0). Other sets of desorption products were seen at 150, 250, and 430 K, all containing copper atoms and small organic moieties with molecular masses below 100 amu. The latter TPD peak in particular indicates significant fragmentation of the ligands, likely at the C–N bond that holds the vinylsilane-isopropoxide moiety tethered to the ketoimine fragment, and possibly also at the union between the vinylsilane and the alkoxide linker. The 430 K temperature measured for this chemistry may set an upper limit for clean Cu film deposition, but since reactivity on the surface was also found to be inhibited at higher surface coverages, it may be delayed to higher temperatures under atomic layer deposition conditions.
- OSTI ID:
- 22318079
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Issue: 1 Vol. 33; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
Similar Records
Mechanistic studies of palladium thin film growth from palladium(II) {beta}-diketonates. 2. Kinetic analysis of the transmetalation reaction of bis(hexafluoroacetylacetonato)palladium(II) on copper surfaces
Copper CVD chemistry on a reactive substrate: Cu(hfac)[sub 2] and hfacH on Pt(111)
Mechanistic studies of palladium deposition from palladium bis(hexafluoroacetylacetonate) on copper surfaces under ultrahigh vacuum
Journal Article
·
Wed Jun 26 00:00:00 EDT 1996
· Journal of the American Chemical Society
·
OSTI ID:282999
Copper CVD chemistry on a reactive substrate: Cu(hfac)[sub 2] and hfacH on Pt(111)
Journal Article
·
Wed Nov 03 23:00:00 EST 1993
· Journal of Physical Chemistry; (United States)
·
OSTI ID:5576431
Mechanistic studies of palladium deposition from palladium bis(hexafluoroacetylacetonate) on copper surfaces under ultrahigh vacuum
Conference
·
Thu Dec 30 23:00:00 EST 1993
·
OSTI ID:141049